Monte Carlo Simulation In VDDmin Modeling Across Fab Process

Hugo Guo,  Yang Yang,  Bowen Jiang
LSI Corporation


This article discussed the implementation of Monte Carlo method in ATE program to evaluate device’s MinVDD performance. A mathematic function is built to reveal the relationship between MinVDD and major Fab process parameters: Isat N/P. Finally, a simulated MinVDD distribution by Monte Carlo method is drafted and its statistical performance is discussed. It also includes how to reevaluate MinVDD performance with certain process shift.